Multicrystalline Silicon Wafers
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Description
SpecificationsMulticrystalline Silicon Wafers | |
156mm *156mm*200/±30μm | |
Crystal & Material Properties | |
Property | Specifications |
Crystallinity | Multicrystalline |
Conductivity Type/ Dopant | P/ Boron |
Oxygen Concentration | ≤1×1018atoms/ cm3 |
Carbon Concentration | ≤5×1016atoms/ cm3 |
Electrical Properties | |
Property | Specifications |
Resistivity | 0.5-3Ω·cm |
Minority Carrier Life Time | ≥2.0μs |
Geometric Properties | |
Property | Specifications |
Geometry | Square |
Tolerance of the Dimensions (Width/ Length) | 156mm±0.5mm |
Thickness | 200±30μm |
Angle between Sides | 90°±0.3° |
Chamfer | Chamfer angle:45°±10° ;Chamfer dimension: 1.5±0.5 mm |
TTV | ≤50μm |
Saw mark Depth | ≤15μm |
Chips | Chips visible as silhouette by illumination from the back are not allowed |
Edge chips,corner chips | Length≤1.5mm;Depth≤1mm;Max.2 places, No V shape |
Surface Properties | |
Property | Specifications |
Surface | As-cut and cleaned, visible contaminations |
Cracks & Pinholes | Not allowed |
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Multicrystalline Silicon Wafers
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